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Updated: Jun 7, 2026

Non-equilibrium Microwave Plasma for Efficient High Temperature Chemistry
Published on: August 1, 2017
Spatially resolvable optical emission spectrometer for analyzing density uniformity of semiconductor process plasma
Changhoon Oh1, Hoonchul Ryoo, Hyungwoo Lee
1Nano Photonics Laboratory, School of Mechanical Engineering, Yonsei University, 134 Sinchon-dong, Seodaemun-gu, Seoul 120-749, South Korea.
Abstract:
We proposed a spatially resolved optical emission spectrometer (SROES) for analyzing the uniformity of plasma density for semiconductor processes. To enhance the spatial resolution of the SROES, we constructed a SROES system using a series of lenses, apertures, and pinholes. We calculated the spatial resolution of the SROES for the variation of pinhole size, and our calculated results were in good agreement with the measured spatial variation of the constructed SROES. The performance of the SROES was also verified by detecting the correlation between the distribution of a fluorine radical in inductively coupled plasma etch process and the etch rate of a SiO(2) film on a silicon wafer.
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