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Published on: December 8, 2016
Block copolymer nanolithography: translation of molecular level control to nanoscale patterns
Joona Bang1, Unyong Jeong, Du Yeol Ryu
1Department of Chemical and Biological Engineering, Korea University, 136-713 Seoul, Korea.
Advanced Materials (Deerfield Beach, Fla.)
|November 5, 2010
Abstract:
The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.

