Interferometric fabrication of modulated submicrometer gratings in photoresist

Interferometric recording is applied to the fabrication of modulated submicrometer gratings in photoresist.High diffraction efficiency requires optimized recording conditions, which are obtained by the use of an on-axis continuous surface-relief grating for the generation of the object beam. The optimized phase function is copied into the resist layer by means of a self-aligned two-step recording process with an intermediate copy in a volume photopolymer hologram. As a result, we demonstrate high carrier frequency surface-relief off-axis fan-out gratings for illumination in transmission with visible light.