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The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
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Importance of trimethylaluminum diffusion in three-step ABC molecular layer deposition using trimethylaluminum,

Dragos Seghete1, Robert A Hall, Byunghoon Yoon

  • 1Department of Chemistry and Biochemistry, University of Colorado at Boulder, Boulder, Colorado 80309, United States.

Langmuir : the ACS Journal of Surfaces and Colloids
|December 2, 2010
PubMed

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