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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
10 micrometer-scale SPM local oxidation lithography.
Takashi Toyofuku1, Shinya Nishimura, Kazuya Miyashita
1Department of Electrical and Electronic Engineering, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan.
Journal of Nanoscience and Nanotechnology
|December 7, 2010
Summary
Scanning probe microscopy (SPM) enabled large-scale silicon oxidation using a modified tip. Higher contact forces improved oxide uniformity and throughput, suggesting a scalable lithography method.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Science
Background:
- Scanning probe microscopy (SPM) offers high-resolution patterning capabilities.
- Local oxidation lithography is a key technique for nanoscale fabrication.
- Scaling SPM-based lithography to larger areas remains a challenge.
Purpose of the Study:
- To investigate the feasibility of large-scale oxidation using SPM.
- To optimize SPM parameters for enhanced oxidation throughput and uniformity.
- To explore the effect of SPM tip geometry on oxidation dimensions.
Main Methods:
- Focused-ion-beam (FIB) etching was used to prepare SPM tips with a 15 micrometer contact length.
- Contact mode SPM was employed for local oxidation of silicon.
- Oxidation parameters including contact force (0.1–2.1 microN), bias voltage (50 V), and scanning speed (10–200 microm/s) were systematically varied.
Main Results:
- High contact force resulted in uniform silicon oxide formation, even at high scanning speeds.
- An increased SPM tip contact length enhanced the water meniscus, leading to larger oxide dimensions.
- A throughput of approximately 10^3 microm^2/s was achieved by optimizing scanning speed and contact force.
Conclusions:
- SPM local oxidation can be effectively scaled up for larger area fabrication.
- Utilizing SPM tips with extended contact lengths is crucial for upscaling the process.
- This method offers a promising route for high-throughput nanoscale patterning.
