Interaction between sputtered beta-Ta films and diamond-like carbon with Ru intermediate layer.

Jianhui Wang1, Sam Zhang, Yibin Li

  • 1School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Avenue, 639798, Singapore.

Summary

Ruthenium interlayers prevent detrimental reactions between tantalum and diamond-like carbon films, enhancing thermal stability and performance for magnetic recording applications.

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