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Published on: December 8, 2016
Nanolithographic templates using diblock copolymer films on chemically heterogeneous substrates
Vassilios Kapaklis1, Spyridon Grammatikopoulos, Roman Sordan
1Department of Physics and Astronomy, Division of Materials Physics, Uppsala University, Box 516, 75120 Uppsala, Sweden.
Journal of Nanoscience and Nanotechnology
|December 8, 2010
Summary
Researchers control polymer thin film lamellae orientation using modified substrates. This technique enables precise nanolithographic template fabrication for advanced materials.
Area of Science:
- Materials Science
- Polymer Science
- Nanotechnology
Background:
- The orientation of lamellae in diblock copolymer thin films is crucial for their applications.
- Wetting properties of polymer blocks significantly influence lamellar orientation on substrates.
- Polystyrene-b-polymethylmethacrylate (PS-b-PMMA) films on silicon typically exhibit parallel lamellae.
Purpose of the Study:
- To develop a method for inducing perpendicular lamellar orientation in diblock copolymer thin films.
- To achieve spatial control over lamellar orientation at the nanoscale.
- To create well-defined nanolithographic templates using block copolymer films.
Main Methods:
- Utilizing chemically modified substrates with self-assembled monolayers (SAMs) of thiol-terminated alkane chains on gold films.
- Employing patterned substrates to guide the perpendicular orientation of lamellae.
- Using etching techniques to refine the nanostructure.
Main Results:
- Successfully induced perpendicular orientation of PS-b-PMMA lamellae to the substrate.
- Demonstrated spatial control of perpendicular orientation at sub-micron scales using chemical patterns.
- Fabricated nanolithographic templates with controlled feature sizes.
Conclusions:
- Chemically modified substrates offer a versatile route to control block copolymer thin film morphology.
- This methodology provides a pathway for creating precise nanolithographic templates.
- The technique holds significant technological potential for advanced material fabrication and nanotechnology.

