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Related Concept Videos

Characteristics and Nomenclature of Copolymers01:24

Characteristics and Nomenclature of Copolymers

Copolymers are the products obtained from the polymerization of multiple monomer species. So, in a polymer chain itself, there can be multiple repeating units that come from different monomers. The process of synthesizing a polymer from different monomer species is called copolymerization. When two monomers are involved, the polymer is known as a bipolymer. Polymers with three and four monomers are termed terpolymers and quaterpolymers, respectively. Figure 1 depicts the copolymerization of...

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Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers
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Rectangular patterns using block copolymer directed assembly for high bit aspect ratio patterned media.

Ricardo Ruiz1, Elizabeth Dobisz, Thomas R Albrecht

  • 1San Jose Research Center, Hitachi Global Storage Technologies, San Jose, California 95135, United States. ricardo.ruiz@hitachigst.com

ACS Nano
|December 25, 2010
PubMed
Summary
This summary is machine-generated.

A novel nanofabrication technique merges block copolymer assembly with e-beam lithography to create uniform, high-density rectangular patterns. This method is ideal for advanced applications like magnetic bit patterned media.

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Area of Science:

  • Nanotechnology
  • Materials Science
  • Lithography

Background:

  • Block copolymers self-assemble into periodic nanostructures.
  • Achieving arbitrary geometries and high densities with block copolymers is challenging.
  • E-beam lithography offers high resolution but can be slow for large areas.

Purpose of the Study:

  • To develop a hybrid nanofabrication method combining block copolymer directed assembly and e-beam lithography.
  • To achieve highly uniform rectangular nanostructures with controlled dimensions and aspect ratios.
  • To enable the fabrication of high-density patterns for advanced applications.

Main Methods:

  • Utilizing block copolymer directed assembly to define initial nanostructures.
  • Employing e-beam lithography to modify and enhance the block copolymer patterns.
  • Achieving critical dimensions of 16 nm and a full pitch of 27 nm.

Main Results:

  • Demonstrated a nanofabrication method yielding highly uniform rectangular patterns.
  • Achieved arbitrary aspect ratios while preserving feature uniformity and spacing.
  • Sustained long-range translational order and enabled high-density patterns through feature multiplication.

Conclusions:

  • The combined approach overcomes limitations of individual methods, enabling complex nanogeometries.
  • The fabricated patterns are suitable for high-resolution, high-density applications.
  • This technique shows significant promise for fabricating magnetic bit patterned media with high bit aspect ratios.