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A high voltage pulse power supply for metal plasma immersion ion implantation and deposition

M C Salvadori1, F S Teixeira, W W R Araújo

  • 1Institute of Physics, University of São Paulo, C.P. 66318, CEP 05315-970 São Paulo SP, Brazil. mcsalvadori@if.usp.br

The Review of Scientific Instruments
|January 5, 2011
PubMed

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