Ultrasmall structure fabrication via a facile size modification of nanoimprinted functional silsesquioxane features

We propose a simple and robust scheme for a precise and controlled fabrication of ultrasmall structures through the direct size modification (either reduction or increment) of functional nanoimprinted silsesquioxane (SSQ) patterns. The size modification of nanopatterned SSQ polymer features was achieved according to two different independent approaches. In the first approach, feature size was reduced by a simple heat-induced mass loss mechanism; in the second approach structure size increment was achieved by building multiple polymeric layers on top of imprinted patterns. The fabricated arrays follow the shape contour of the patterned structures so the original imprinted profile is preserved. The engineered capabilities were applied to produce high resolution stamps for nanoimprinting. These approaches free the need for sophisticated nanofabrication techniques and expensive facilities required for nanopatterning.