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Updated: Jun 4, 2026

Fabrication and Characterization of High-Q Silicon Nitride Membrane Resonators
Published on: August 8, 2025
Fabrication and characterization of high-quality-factor silicon nitride nanobeam cavities
Mughees Khan1, Thomas Babinec, Murray W McCutcheon
1School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA. mkhan@seas.harvard.edu
Abstract:
We present the fabrication and characterization of high-quality-factor (Q) Si3N4 photonic crystal nanobeam cavities at visible wavelengths for coupling to nitrogen-vacancy centers in a cavity QED system. Confocal microphotoluminescence analysis of the nanobeam cavities demonstrates quality factors up to Q ~ 55,000, which are limited by the resolution of our grating spectrometer. This is a 1-order-of-magnitude improvement over previous SiNx cavities at this important wavelength range. We also demonstrate coarse tuning of cavity resonances across 600-700 nm by lithographically scaling the size of fabricated devices.

