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Related Experiment Video

Updated: Jun 4, 2026

Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
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Tungsten/Magnesium silicide multilayers for soft x-ray optics.

P Boher1, P Houdy, M Kühne

  • 1Laboratoires d'Electronique Philips (LEP), 22 Avenue Descartes, BP15, 94453 Limeil-Brevannes Cedex, France.

Journal of X-Ray Science and Technology
|February 11, 2011
PubMed
Summary

Tungsten/Magnesium Silicide (W/Mg2Si) multilayers demonstrate high reflectivity for soft X-ray optics. These advanced materials show promise for applications utilizing MgKα and MgLα X-ray lines.

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Area of Science:

  • Materials Science
  • Optics
  • X-ray Physics

Background:

  • Soft X-ray optics require specialized multilayer coatings for efficient performance.
  • Tungsten/Magnesium Silicide (W/Mg2Si) multilayers are investigated for their potential in this domain.
  • Previous systems like Molybdenum/Silicon (Mo/Si) have limitations in selectivity and reflectivity.

Purpose of the Study:

  • To deposit and characterize W/Mg2Si multilayers for soft X-ray optics.
  • To evaluate their performance specifically around the MgKα and MgLα X-ray lines.
  • To correlate structural properties with observed soft X-ray performance.

Main Methods:

  • Radio frequency (RF) sputtering deposition technique.
  • In situ kinetic ellipsometry and ex situ grazing X-ray reflection for structural analysis.

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  • High-resolution electron microscopy (HREM) for interface and layer characterization.
  • Synchrotron radiation measurements to assess soft X-ray performance.
  • Main Results:

    • Achieved first Bragg peak reflectivities up to 31% for multilayers with a 84 Å double period.
    • Observed well-defined Bragg peaks even for smaller double periods down to 44 Å.
    • Demonstrated over 20% reflectivity near the MgLα line at normal incidence.
    • Exhibited two times higher selectivity compared to conventional Mo/Si systems at MgLα wavelengths.

    Conclusions:

    • W/Mg2Si multilayers are effective for soft X-ray optics, particularly for MgKα and MgLα lines.
    • Structural characteristics significantly influence soft X-ray performance, with interface interdiffusion impacting reflectivity.
    • These multilayers offer superior selectivity over conventional systems, opening new possibilities for X-ray applications.