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Interface segregating fluoralkyl-modified polymers for high-fidelity block copolymer nanoimprint lithography
Vincent S D Voet1, Teresa E Pick, Sang-Min Park
1The Molecular Foundry, Lawrence Berkeley National Laboratory, One Cyclotron Road, Berkeley, California 94720, USA.
Journal of the American Chemical Society
|February 17, 2011
Summary
Researchers developed additives to reduce adhesion in block copolymer (BCP) lithography, enabling defect-free nanoimprinting for high-density nanoscale feature fabrication.
Area of Science:
- Materials Science
- Nanotechnology
- Polymer Chemistry
Background:
- Block copolymer (BCP) lithography enables high-density nanoscale feature fabrication.
- Nanoimprint lithography offers a high-throughput method for pattern transfer using reusable molds.
- High adhesion between BCPs and nanoimprint molds hinders defect-free pattern formation.
Purpose of the Study:
- To synthesize additives that mitigate mold-polymer adhesion during BCP lithography.
- To improve the defect-free nanoimprint process for high-throughput nanofabrication.
Main Methods:
- Synthesis of PS- and PDMS-based additives with fluoroalkyl chains.
- Blending additives with PS-b-PDMS BCPs.
- Thermal nanoimprint lithography and subsequent lithographic analysis.
Main Results:
- Fluoroalkyl-modified PS additives significantly reduced film adhesion to the nanoimprint mold.
- Nearly defect-free nanoimprints were achieved with the modified BCPs.
- Excellent graphoepitaxial alignment of sub-10 nm BCP microdomains was demonstrated.
Conclusions:
- Additives effectively reduce adhesion in BCP nanoimprint lithography.
- This approach enables defect-free patterning for advanced nanofabrication.
- The method is crucial for cost-effective, high-throughput production of nanoscale features.
