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Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities

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Published on: July 24, 2015

Heat transfer between graphene and amorphous SiO2.

B N J Persson¹, H Ueba

¹Division of Nanotechnology and New Functional Material Science, Graduate School of Science and Engineering, University of Toyama, Toyama, Japan.

Journal of Physics. Condensed Matter : an Institute of Physics Journal

|March 16, 2011

Summary

This summary is machine-generated.

We investigated heat transfer between graphene and amorphous silicon dioxide (SiO2). The dominant heat transfer occurs at the real contact area, aligning well with experimental findings.

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Area of Science:

Materials Science
Thermal Engineering
Nanotechnology

Background:

Understanding heat transfer in nanoscale systems is crucial for thermal management.
Graphene and amorphous silicon dioxide are key materials in microelectronics and thermal interface applications.

Purpose of the Study:

To comprehensively study heat transfer mechanisms between graphene and amorphous silicon dioxide.
To quantify contributions from contact, non-contact, and radiative heat transfer.

Main Methods:

Modeling heat transfer across the real contact area.
Analyzing heat transfer in the non-contact region, including gas conduction and radiative transfer via evanescent waves.

Main Results:

The primary heat transfer pathway identified is through the area of real contact.
Calculated heat transfer coefficients show strong agreement with experimental data.

Conclusions:

Real contact area dominates heat transfer between graphene and amorphous SiO2.
The study provides a validated model for predicting thermal performance in such interfaces.