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Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
Published on: December 16, 2011
Sreenivasa Reddy Puniredd1, Ossama Assad, Thomas Stelzner
1The Department of Chemical Engineering and Russell Berrie Nanotechnology Institute, Technion-Israel Institute of Technology, Haifa 32000, Israel.
This study introduces a simple, catalyst-free method for functionalizing silicon (Si) surfaces and nanowires. This versatile technique enables stable organic and inorganic material attachment for advanced electronic and sensing devices.
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