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Updated: Jun 3, 2026

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
Application of scanning probe lithography to graphite patterning
Hyeondeuk Yong1, Hyunsoo Lee, K B Kim
1Faculty of Nanotechnology and Advanced Material Engineering, Sejong University, Seoul 143-747, South Korea.
Scanning probe lithography in air patterns graphite by etching or oxidation. This technique enables graphene layer peeling for potential nano-device fabrication without contamination.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Science
Background:
- Graphite patterning is crucial for fabricating nano-devices.
- Scanning probe lithography offers precise nanoscale manipulation.
- Understanding tip-sample interactions in ambient conditions is essential.
Purpose of the Study:
- To investigate graphite patterning using scanning probe lithography in air.
- To analyze the effects of local electric fields on graphite surfaces.
- To explore the potential of this technique for graphene nano-fabrication.
Main Methods:
- Applied scanning probe lithography for graphite patterning in ambient air.
- Utilized lateral force microscopy to analyze frictional forces.
- Employed Raman spectroscopy for material characterization.
Main Results:
- Local electric fields induced either etching or oxidation of graphite.
- Oxidized graphite surfaces exhibited significantly increased frictional forces.
- Graphene layers were successfully peeled from the graphite surface via etching.
Conclusions:
- Scanning probe lithography in air provides controllable graphite modification.
- The observed phenomena offer insights into tip-graphite interactions.
- This method presents a promising contamination-free, top-down approach for graphene nano-device fabrication.
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