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Updated: Jun 2, 2026

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
Published on: January 23, 2013
Method for patterning various nanomaterials: electrochemical deposition of patterned Ni thin films and their
Hitoshi Ogihara1, Masaru Fukasawa, Tetsuo Saji
1Department of Chemistry & Materials Science, Tokyo Institute of Technology 2-12-1, Ookayama, Tokyo 152-8552, Japan. ogihara@cms.titech.ac.jp
Abstract:
We report an interesting approach for preparing micropatternings of nanomaterials, such as carbon nanotubes and TiO(2) nanoparticles. In the method, exfoliation of electrodeposited Ni thin films was the key process. After patterning indium thin oxide (ITO) plates with an insulating photoresist by conventional photolithography, Ni was electrodeposited on only the exposed ITO areas. The resulting substrates were evenly covered with nanomaterials by a drop cast method. By exfoliating the electrodeposited Ni thin films from the substrates, patterned nanomaterial films were formed.
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