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Binary amplitude holograms made from dyed photoresist
Quandou Wang1, Ulf Griesmann, John H Burnett
1National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.
Optics Letters
|May 20, 2011
Summary
This study details a new method for creating binary amplitude holograms using dyed photoresist. These holograms are valuable for precise metrology of aspheric surfaces and wavefronts.
Area of Science:
- Optics and Photonics
- Materials Science
- Metrology
Background:
- Binary amplitude holograms are crucial for optical metrology.
- Fabricating high-quality holograms with specific light absorption properties presents challenges.
Purpose of the Study:
- To develop a novel method for fabricating binary amplitude holograms using dyed photoresist.
- To enable precise metrology of aspheric surfaces and wavefronts.
Main Methods:
- Dissolving a light-absorbing pigment (near 633 nm) in positive photoresist.
- Spin-coating dyed resist onto silica glass substrates to create stable, opaque layers.
- Utilizing contact lithography to fabricate Fresnel zone plates from the dyed resist.
Main Results:
- Achieved stable photoresist layers that are opaque at 633 nm.
- Demonstrated effective fabrication of a Fresnel zone plate using the dyed resist method.
- Confirmed the performance of the fabricated hologram at 633 nm.
Conclusions:
- The dyed photoresist method is effective for fabricating binary amplitude holograms.
- This technique is suitable for applications in null optics for aspheric surface and wavefront metrology.
- The method offers a viable approach for creating specialized holographic optical elements.
