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Related Experiment Video

Updated: Jun 1, 2026

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

Deterministic nanotexturing by directional photofluidization lithography

Seungwoo Lee¹, Jonghwa Shin, Hong Suk Kang

¹Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology, Daejeon, Korea. ace51@kaist.ac.kr

Advanced Materials (Deerfield Beach, Fla.)

|June 4, 2011

Summary

No abstract available in PubMed .

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