Ultrahigh-Density Carbon Nanoring Arrays on Silicon Wafer through Templated Solution Deposition Method

Ultrahigh-density carbon nanoring arrays on a silicon wafer are achieved by a novel templated solution deposition method. Initially the silica nanodot arrays obtained from a nanoporous thin film are used as a template to direct the surface dewetting of a phenolic precursor, while further curing and calcination of the phenolic precursor, followed by etching of the silica arrays, results in large area carbon nanoring arrays with a diameter as small as 25 nm. This study provides a simple and robust chemical route to fabricate complex nanoring arrays with ultrahigh density of about one terabit per square inch.