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Proof-of-Concept for Gas-Entrapping Membranes Derived from Water-Loving SiO2/Si/SiO2 Wafers for Green Desalination
Published on: March 1, 2020
2-step plasma-enhanced CVD for low-temperature fabrication of silica membranes with high gas-separation performance
Toshinori Tsuru1, Hironobu Shigemoto, Masakoto Kanezashi
1Department of Chemical Engineering, Hiroshima University, Higashi-Hiroshima 739-8527, Japan. tsuru@hiroshima-u.acjp
Chemical Communications (Cambridge, England)
|June 18, 2011
Abstract:
Amorphous SiO(2) membranes were prepared via a 2-step plasma-enhanced CVD (PECVD) technique at room temperature on porous TiO(2)/Al(2)O(3) substrates. SiO(2) membranes showed molecular sieving properties with a high separation factor for He/N(2) and He/H(2), and high thermal stability, indicating the successful preparation of high-performance membranes at low temperatures.
