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Transport spectroscopy of single Pt impurities in silicon using Schottky barrier MOSFETs
L E Calvet1, W Wernsdorfer, J P Snyder
1Institut d'Electronique Fondamentale-CNRS UMR 8622, Université Paris-Sud, 91405 Orsay, France.
Abstract:
We investigate low temperature electron transport in silicon Schottky barrier metal-oxide-semiconductor field-effect transistors (MOSFETs), which consist of PtSi metallic source/drain electrodes. Measurements are made on approximately 23 inversion layers and resonances attributed to single impurities close to the metal/semiconductor interface are observed. We ascribe these impurities to Pt atoms that have diffused into the semiconductor channel from the contacts.

