Micromachined silicon transmission electron microscopy grids for direct characterization of as-grown nanotubes

Transmission electron microscopy (TEM) is a key technique in the structural characterization of carbon nanotubes. For device applications, carbon nanotubes are typically grown by chemical vapour deposition (CVD) on silicon substrates. However, TEM requires very thin samples, which are electron transparent. Therefore, for TEM analysis, CVD grown nanotubes are typically deposited on commercial TEM grids by post-processing. However, this procedure can damage the nanotubes, and it does not work reliably if the nanotube density is too low. The ability to do TEM directly on as-grown nanotubes on the silicon substrate would solve these problems. For this purpose, we have fabricated micromachined silicon TEM grids with narrow open slits on them. Since the nanotubes grown on these substrates are suspended freely over the open slits, the micromachined substrates form a natural TEM grid for direct imaging of CVD grown nanotubes. Furthermore, the background noise is significantly reduced during micro-Raman spectroscopy, resulting in a better signal-to-noise ratio. As a result, these micromachined Si substrates provide a low cost, mass producible, efficient, and reliable platform for direct TEM, SEM, AFM, and Raman characterization of as-grown nanotubes. These grids can be used for characterizing a wide range of other nanomaterials, including peapods, nanowires, and nanofibres.