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Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
Published on: January 23, 2013
Narrow linewidth templates for nanoimprint lithography utilizing conformal deposition
Jukka Viheriälä1, Tuomo Rytkönen, Tapio Niemi
1Optoelectronics Research Centre, Tampere University of Technology, PO Box 692, FIN-33101 Tampere, Finland.
Nanotechnology
|July 7, 2011
Summary
A novel process for fabricating nanoimprint templates with 20 nm linewidths was developed. This method enables cost-efficient, large-area nanopatterning for advanced applications like quantum rings and ultrahigh-density memory.
Area of Science:
- Nanotechnology
- Materials Science
- Lithography
Background:
- Nanoimprint lithography offers cost-efficient, large-area patterning.
- Fabricating nanoimprint templates with narrow linewidths is challenging.
- Electron beam lithography is costly and time-consuming for large areas and small linewidths.
Purpose of the Study:
- To develop a novel, cost-effective process for creating narrow-linewidth nanopatterns for nanoimprint templates.
- To demonstrate the fabrication of nanosized loops and lines with tunable linewidths.
- To utilize the fabricated template for replicating structures via UV nanoimprint lithography.
Main Methods:
- Developed a novel process based on conformal thin-film deposition on seed nanopatterns.
- Fabricated nanosized loops and lines with tunable linewidths down to 20 nm.
- Used the fabricated template in soft-stamp UV nanoimprint lithography to replicate structures in UV-curable resist.
Main Results:
- Successfully fabricated nanoimprint templates with precisely tunable linewidths.
- Achieved linewidths as small as 20 nm.
- Demonstrated successful replication of nanosized loops and lines using UV nanoimprint lithography.
Conclusions:
- The novel conformal deposition process provides a cost-efficient method for fabricating nanoimprint templates with ultra-narrow linewidths.
- The fabricated templates are suitable for replicating advanced nanostructures.
- This technique has potential applications in fields requiring precise nanoscale patterning, such as negative refractive index materials, ultrahigh-density memory, and quantum rings.
