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How flat is an air-cleaved mica surface?
F Ostendorf1, C Schmitz, S Hirth
1Fachbereich Physik, Universität Osnabrück, Barbarastraße 7, 49076 Osnabrück, Germany.
Nanotechnology
|August 11, 2011
Summary
Air-cleaved muscovite mica surfaces, when studied by dynamic atomic force microscopy (AFM), reveal nanoscale particles and crystallites. These surfaces exhibit roughness, even after ultra-high vacuum (UHV) treatment, impacting their use as atomically flat substrates.
Area of Science:
- Materials Science
- Surface Science
- Nanotechnology
Background:
- Muscovite mica is a standard substrate for biological materials due to its {001} cleavage planes.
- Atomic Force Microscopy (AFM), particularly non-contact mode (NC-AFM), is a key technique for surface characterization.
- Surface charges on mica cleaved in ultra-high vacuum (UHV) hinder NC-AFM imaging.
Purpose of the Study:
- To investigate the surface morphology of muscovite mica using NC-AFM.
- To understand the effect of cleavage environment (air vs. UHV) on mica surface properties.
- To assess the suitability of mica surfaces for high-resolution imaging after UHV treatment.
Main Methods:
- Dynamic atomic force microscopy (AFM) operated in non-contact mode (NC-AFM).
- Experiments conducted under ultra-high vacuum (UHV) conditions.
- Comparison of mica surfaces cleaved in air versus UHV.
Main Results:
- Mica surfaces cleaved in air exhibit significantly less surface charge, enabling NC-AFM imaging.
- Highly resolved NC-AFM images show rough morphology with a high density of nanometre-sized particles.
- Regularly shaped structures indicate the growth of crystallites on the mica surface.
- Contamination layers persist even after degassing and heating at 560 K in UHV, preventing atomically flat surfaces.
Conclusions:
- Cleavage in air is crucial for obtaining NC-AFM-imaged mica surfaces.
- Air-cleaved mica surfaces are characterized by nanoscale particles and crystallites, not atomically flat.
- The persistent contamination layer limits the use of UHV-treated mica as an atomically flat substrate for certain applications.

