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Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and
R A Loch1, A Dubrouil, R Sobierajski
1FOM Institute for Plasma Physics Rijnhuizen, Nieuwegein, The Netherlands. r.a.loch@rijnhuizen.nl
Abstract:
We characterize the phase shift induced by reflection on a multilayer mirror in the extreme UV range (80-93 eV) using two techniques: one based on high order harmonic generation and attosecond metrology (reconstruction of attosecond beating by interference of two-photon transitions), and a second based on synchrotron radiation and measurements of standing waves (total electron yield). We find an excellent agreement between the results from the two measurements and a flat group delay shift (±40 as) over the main reflectivity peak of the mirror.
