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Updated: May 29, 2026

Epitaxial Nanostructured α-Quartz Films on Silicon: From the Material to New Devices
Published on: October 6, 2020
Self-organized poly(n-octadecylsilsesquioxane) films via sol-gel photopolymerization
Abraham Chemtob1, Lingli Ni, Céline Croutxé-Barghorn
1Laboratory of Photochemistry and Macromolecular Engineering, CNRS, ENSCMu, LRC 7228, University of Haute-Alsace, 3 rue Alfred Werner 68093 Mulhouse Cedex, France. Abraham.chemtob@uha.fr
Abstract:
We describe a novel solvent- and water-free sol-gel process for n-octadecyltriclorosilane (C(18)H(37)SiCl(3)) film catalyzed by photogenerated Brönsted acids. Driven by hydrophobic van der Waals interactions, a photoinduced self-assembly process occurs to afford a long-range ordered lamellar mesostructure, characterized by X-ray diffraction and transmission electron microscopy. Real-time Fourier transform IR spectroscopy was instrumental to probe the fast hydrolysis kinetics and assess the change of conformational behavior of the alkyl chains during UV irradiation. A unique combination of different solid-state NMR techniques ((29)Si, (13)C, (1)H) provided an insight into the supramolecular organization of this hybrid film.

