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Published on: July 12, 2017
Ho:YLF & Ho:LuLF slab amplifier system delivering 200 mJ, 2 µm single-frequency pulses
H J Strauss1, W Koen, C Bollig
1National Laser Centre, Council for Scientific and Industrial Research, PO Box 395, Pretoria 0001, South Africa. hstrauss@csir.co.za
Optics Express
|September 22, 2011
Summary
A novel Ho:YLF and Ho:LuLF slab amplifier achieved 210 mJ output at 2064 nm. This scalable architecture was end-pumped by a Tm:YLF laser and seeded by a Ho:YLF ring laser.
Area of Science:
- Laser physics
- Solid-state laser technology
Background:
- High-energy, single-frequency lasers are crucial for various scientific applications.
- Developing scalable laser architectures is essential for increasing output energy.
Purpose of the Study:
- To demonstrate a high-energy, single-frequency, single-pass amplifier using Ho:YLF and Ho:LuLF materials.
- To investigate the performance of a scalable slab architecture for such amplifiers.
Main Methods:
- Utilized a scalable slab architecture for the amplifier.
- Employed holmium-doped yttrium lithium fluoride (Ho:YLF) and lutetium lithium fluoride (Ho:LuLF) as gain media.
- End-pumped the amplifier using a 1890 nm thulium-doped yttrium lithium fluoride (Tm:YLF) slab laser.
- Seeded the amplifier with a 69 mJ single-frequency Ho:YLF ring laser operating at 50 Hz.
Main Results:
- Achieved a maximum output energy of 210 mJ at a wavelength of 2064 nm.
- Demonstrated the effectiveness of the scalable slab architecture for high-energy amplification.
- Confirmed single-frequency operation of the amplified output.
Conclusions:
- The demonstrated Ho:YLF and Ho:LuLF slab amplifier represents a significant advancement in high-energy, single-frequency laser sources.
- The scalable architecture shows promise for future development of even higher-power laser systems at 2064 nm.

