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The Generation of Higher-order Laguerre-Gauss Optical Beams for High-precision Interferometry

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Published on: August 12, 2013

Generation of extreme ultraviolet vortex beams using computer generated holograms.

Bernd Terhalle¹, Andreas Langner, Birgit Päivänranta

¹Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute, CH-5232 Villigen PSI, Switzerland. bernd.terhalle@psi.ch

|November 4, 2011

Summary

We created computer-generated holograms to produce phase singularities and optical vortices at extreme ultraviolet (EUV) wavelengths. This method enables new studies of singular light fields in EUV interference lithography and X-ray optics.

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Molecular Beam Mass Spectrometry With Tunable Vacuum Ultraviolet (VUV) Synchrotron Radiation

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Published on: October 30, 2012

Area of Science:

Optics and Photonics
Nanotechnology
Quantum Optics

Background:

Phase singularities are crucial for understanding light-matter interactions.
Extreme ultraviolet (EUV) light offers unique properties for high-resolution applications.
Generating and controlling singular light fields in the EUV spectrum is challenging.

Purpose of the Study:

To fabricate computer-generated holograms for generating phase singularities at EUV wavelengths.
To demonstrate the generation of optical vortices in nonzero diffraction orders using these holograms.
To establish a foundation for advanced research in EUV singular light fields and applications.

Main Methods:

Fabrication of computer-generated holograms via electron beam lithography.
Generation of optical vortices in nonzero diffraction orders.
Interferometric verification of helical phase structure.
Observation of characteristic vortex beam intensity distribution.

Main Results:

Successfully generated phase singularities and optical vortices at EUV wavelengths.
Demonstrated control over vortex beam properties in nonzero diffraction orders.
Verified the helical phase structure of the generated beams.

Conclusions:

The presented holographic method is effective for generating singular light fields in the EUV.
This technique is suitable for EUV interference lithography.
The achromatic nature of the method suggests potential applications in X-ray optics.