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Processing of SiO2 protective layer using HMDS precursor by combustion CVD
Kyoung-Soo Park1, Youngman Kim
1Department of Materials Science and Engineering, Chonnam National University, Gwangju, 500-757, Korea.
Abstract:
Hexamethyldisilazane (HMDS, [(CH3)3Si]2NH) was used as a precursor to form SiO2 protective coatings on IN738LC alloys by combustion chemical vapor deposition (CCVD). SEM and XPS showed that the processed coatings were composed mainly of SiO2. The amount of HMDS had the largest effect on the size of the SiO2 agglomerates and the thickness of the deposited coatings. The specimens coated with SiO2 using the 0.05 mol/l HMDS solution showed a significantly higher temperature oxidation resistance than those deposited under other conditions.
