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Processing of SiO2 protective layer using HMDS precursor by combustion CVD.

Kyoung-Soo Park¹, Youngman Kim

¹Department of Materials Science and Engineering, Chonnam National University, Gwangju, 500-757, Korea.

Journal of Nanoscience and Nanotechnology

|November 23, 2011

Summary

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Hexamethyldisilazane (HMDS) precursor formed SiO2 coatings on IN738LC alloys via CCVD. Optimized HMDS concentration yielded superior oxidation resistance, demonstrating effective protective coating potential.

Area of Science:

Materials Science
Surface Engineering
Chemical Engineering

Background:

IN738LC alloys are susceptible to high-temperature oxidation.
Protective coatings are crucial for enhancing alloy performance in demanding environments.
Combustion Chemical Vapor Deposition (CCVD) offers a method for applying ceramic coatings.

Purpose of the Study:

To investigate the formation of SiO2 protective coatings on IN738LC alloys using Hexamethyldisilazane (HMDS) as a precursor via CCVD.
To determine the effect of HMDS concentration on coating properties and oxidation resistance.
To identify optimal conditions for enhanced high-temperature performance.

Main Methods:

Combustion Chemical Vapor Deposition (CCVD) using Hexamethyldisilazane (HMDS) as a precursor.

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Scanning Electron Microscopy (SEM) for surface morphology and coating thickness analysis.

X-ray Photoelectron Spectroscopy (XPS) for elemental composition analysis of the coatings.

Main Results:

SiO2 coatings were successfully deposited on IN738LC alloys.
The amount of HMDS significantly influenced SiO2 agglomerate size and coating thickness.
Coatings formed using 0.05 mol/l HMDS exhibited superior high-temperature oxidation resistance compared to other concentrations.

Conclusions:

HMDS is a viable precursor for CCVD synthesis of SiO2 coatings.
Optimizing HMDS concentration is critical for controlling coating characteristics.
The study demonstrates a promising method for improving the oxidation resistance of IN738LC alloys.