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Characterization of Surface Modifications by White Light Interferometry: Applications in Ion Sputtering, Laser Ablation, and Tribology Experiments

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Two-wavelength in-line phase-shifting interferometry based on polarizing separation for accurate surface profiling.

D G Abdelsalam¹, Daesuk Kim

¹Division of Mechanical System Engineering, Chonbuk National University, Jeonju, South Korea.

|November 24, 2011

Summary

This study introduces a two-wavelength phase-shifting interferometry method using polarizing separation for precise step height measurements. The seven-phase step algorithm effectively reduces noise, yielding accurate height maps comparable to off-axis techniques.

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Area of Science:

Optical Metrology
Interferometry
Surface Profilometry

Background:

Phase-shifting interferometry (PSI) is a key technique for high-resolution surface measurements.
Two-wavelength interferometry (TWI) extends measurement range by combining wavelengths.
Polarizing separation offers a method for in-line configurations.

Purpose of the Study:

To present and evaluate a novel two-wavelength phase-shifting in-line interferometry configuration.
To compare the efficacy of five- and seven-phase step algorithms in noise reduction.
To validate the measurement accuracy against established methods.

Main Methods:

Utilized a two-wavelength phase-shifting in-line interferometer with polarizing separation.
Implemented and compared five- and seven-phase step algorithms for phase map generation.
Applied flat fielding for noise reduction and subtracted independent phase maps to obtain beat-wavelength phase.
Converted phase maps to height maps for analysis.

Main Results:

The seven-phase step algorithm demonstrated superior noise reduction compared to the five-phase step algorithm.
The flat fielding method further enhanced phase map quality.
Accurate step height measurements (nominally 1.34 μm) were achieved.
Results were in strong agreement with those obtained from a single-shot off-axis geometry.

Conclusions:

The developed two-wavelength phase-shifting in-line interferometry configuration is effective for precise metrology.
The seven-phase step algorithm combined with flat fielding provides robust phase map generation.
This method offers a viable alternative for accurate surface height measurements.