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High photocurrent in silicon photoanodes catalyzed by iron oxide thin films for water oxidation
Kimin Jun1, Yun Seog Lee, Tonio Buonassisi
1Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA.
Abstract:
Silicon splits: The application of silicon to water oxidation is limited due to unfavorable interface properties. However, these can be circumvented by using a high-performance silicon photoanode with a catalytically active iron oxide thin film (see picture). This approach results in photocurrents as high as 17 mA cm(-2) under 1 sun and zero overpotential conditions.
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