Updated: May 26, 2026

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
Yung-Chang Lin1, Chun-Chieh Lu, Chao-Huei Yeh
1Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan.
Poly(methyl methacrylate) (PMMA) residue on graphene is difficult to remove completely by annealing. This process can alter graphene's electronic properties and introduce defects, impacting its performance in advanced applications.
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