Advances in top-down and bottom-up surface nanofabrication: techniques, applications & future prospects

Area of Science:

• Materials Science and Engineering
• Nanotechnology
• Device Fabrication

Background:

• Nanofabrication is crucial for developing advanced functional nano-devices.
• The past decade has seen significant progress in both top-down and bottom-up approaches.
• A comprehensive overview of these techniques is needed to guide future research.

Purpose of the Study:

• To review significant nanofabrication techniques developed over the last decade.
• To focus on methods applicable to the fabrication of functional nano-devices.
• To provide a platform for developing new or hybrid nanofabrication techniques.

Main Methods:

• Review of top-down nanofabrication techniques, including advanced lithography (optical, electron beam, soft, nanoimprint, scanning probe, block copolymer).
• Discussion of bottom-up nanofabrication techniques (atomic layer deposition, sol-gel, molecular self-assembly, vapor-phase deposition, DNA-scaffolding).
• Specific focus on advances in fabricating functional nanocomposites and graphene via chemical and physical vapor deposition.

Main Results:

• Detailed overview of multi-directional patterning capabilities (≤100 nm) in top-down methods.
• Highlights progress in various bottom-up techniques for nanoelectronic applications.
• Demonstrates advancements in creating functional nanocomposites and graphene.

Conclusions:

• The reviewed nanofabrication techniques are pivotal for creating novel functional nanostructured devices.
• This comprehensive platform facilitates the development of new and hybrid nanofabrication strategies.
• Continued innovation in nanofabrication is essential for the advancement of nanotechnology.