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Related Concept Videos

Fault Types01:18

Fault Types

When analyzing a single line-to-ground fault from phase A to ground at a three-phase bus, it is important to consider the fault impedance. This impedance is zero for a bolted fault, equal to the arc impedance for an arcing fault, and represents the total fault impedance for a transmission-line insulator flashover. To derive sequence and phase currents, fault conditions are translated from the phase domain to the sequence domain.
For line-to-line faults occurring between phases B and C, the...
Power System Three-Phase Short Circuits01:21

Power System Three-Phase Short Circuits

Determining the subtransient fault current in a power system involves representing transformers by their leakage reactances, transmission lines by their equivalent series reactances, and synchronous machines as constant voltage sources behind their subtransient reactances. In this analysis, certain elements are excluded, such as winding resistances, series resistances, shunt admittances, delta-Y phase shifts, armature resistance, saturation, saliency, non-rotating impedance loads, and small...
Atomic Emission Spectroscopy: Lab01:29

Atomic Emission Spectroscopy: Lab

AES is a powerful analytical technique, especially effective when used with plasma sources, producing abundant spectra in characteristic emission lines. The Inductively Coupled Plasma (ICP), in particular, yields superior quantitative analytical data due to its high stability, low noise, low background, and minimal interferences under optimal experimental conditions. However, newer air-operated microwave sources are emerging as promising alternatives that could be more cost-effective than...
Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle

Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
The ions and electrons produced interact with the fluctuating magnetic field created by a water-cooled...
Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview01:19

Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview

In inductively coupled plasma–mass spectrometry (ICP–MS), an inductively coupled plasma (ICP) torch is used as an atomizer and ionizer. Solid samples are dissolved and volatilized before being introduced into the high-temperature argon plasma, while solution samples are nebulized and passed through the high-temperature argon plasma. Plasma dissociates the analytes and ionizes their component atoms to form a mixture of positive ions and molecular species. The positive ions are then passed on to...
Bus Impedance Matrix01:24

Bus Impedance Matrix

Calculating subtransient fault currents for three-phase faults in an N-bus power system involves using the positive-sequence network. When a three-phase short circuit occurs at a specific bus, the analysis uses the superposition method to evaluate two separate circuits.
In the first circuit, all machine voltage sources are short-circuited, leaving only the prefault voltage source at the fault location. The positive-sequence bus impedance matrix can be determined by solving the nodal equations,...

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Related Experiment Video

Updated: May 26, 2026

An Atmospheric Pressure Plasma Setup to Investigate the Reactive Species Formation
08:36

An Atmospheric Pressure Plasma Setup to Investigate the Reactive Species Formation

Published on: November 3, 2016

Real-time fault classification for plasma processes.

Ryan Yang1, Rongshun Chen

  • 1Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan. ryyanga@gmail.com

Sensors (Basel, Switzerland)
|December 14, 2011
PubMed
Summary
This summary is machine-generated.

This study introduces a new method for real-time plasma fault detection in semiconductor manufacturing using optical emission spectroscopy (OES). The developed technique accurately classifies process faults, improving tool productivity and wafer yield.

Keywords:
fault classificationoptic emission spectrum (OES)process/equipment fault detection

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Area of Science:

  • Semiconductor Manufacturing
  • Plasma Physics
  • Process Control

Background:

  • Plasma process tools are critical and costly in semiconductor fabrication.
  • Process faults in plasma reactors reduce productivity and increase costs.
  • Timely fault detection is essential for maximizing yield and tool uptime.

Purpose of the Study:

  • To develop a real-time method for classifying plasma faults.
  • To improve fault detection accuracy and speed in semiconductor processing.
  • To reduce downtime and enhance productivity in plasma reactors.

Main Methods:

  • Utilized optical emission spectroscopy (OES) for in-situ process monitoring.
  • Employed a matching rate indicator based on spectrum bands (previously developed).
  • Developed a novel real-time classification algorithm for plasma faults.

Main Results:

  • Achieved a novel real-time classification of plasma faults.
  • Validated the proposed fault classification method through experiments.
  • Demonstrated a high overall accuracy rate of approximately 96.4% (27 out of 28 fault events).

Conclusions:

  • The proposed method is feasible for real-time plasma fault classification.
  • Effective fault classification significantly aids in identifying process issues quickly.
  • This approach enhances semiconductor manufacturing efficiency and reduces operational costs.