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$Interference and Diffraction$ 02:18

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Related Experiment Video

Updated: May 25, 2026

Measurement of X-ray Beam Coherence along Multiple Directions Using 2-D Checkerboard Phase Grating

Measurement of X-ray Beam Coherence along Multiple Directions Using 2-D Checkerboard Phase Grating

Published on: October 11, 2016

An EUV beamsplitter based on conical grazing incidence diffraction.

C Braig¹, L Fritzsch, T Käsebier

¹Friedrich-Schiller-Universität Jena, Institut für Angewandte Physik, Jena, Germany. christoph.braig@uni-jena.de

|January 26, 2012

Summary

This summary is machine-generated.

This study introduces a novel grating design for extreme ultraviolet (EUV) radiation, functioning as an efficient, low-loss beamsplitter. The innovative design achieves high efficiency in ±1st order diffraction while eliminating other orders.

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Area of Science:

Optics and Photonics
Materials Science

Background:

Extreme ultraviolet (EUV) radiation requires specialized optical components due to its high absorption.
Efficient beam manipulation is crucial for applications in lithography, microscopy, and spectroscopy.

Purpose of the Study:

To develop and demonstrate an innovative grating design for low-loss, high-efficiency beam splitting of EUV radiation.
To achieve near-perfect beam splitting using a binary grating profile under grazing incidence.

Main Methods:

Utilized conical diffraction geometry with a binary grating profile.
Operated the grating in grazing incidence under total external reflection.
Employed rigorous coupled wave analysis (RCWA) for simulations.
Fabricated and measured a sample of silicon dioxide (SiO2) on silicon.

Main Results:

Demonstrated exclusive ±1st order diffraction with efficiencies up to ~35% per order.
Achieved vanishing higher evanescent orders.
Eliminated the 0th order through destructive interference.
Presented agreement between simulated and measured data.

Conclusions:

The proposed grating design is a highly efficient and low-loss beamsplitter for EUV radiation.
Binary gratings operated under total external reflection offer a promising solution for EUV optics.
The design enables precise control over diffraction orders for advanced EUV applications.