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Versatile multilevel soft lithography method with micrometer alignment using all-flexible rubber stamps and moiré
Omar Fakhr1, Khaled Karrai, Paolo Lugli
1Attocube Systems AG Königinstr. 11a RGB, 80539, Munich, Germany. omar.fakhr@suss.com
Langmuir : the ACS Journal of Surfaces and Colloids
|February 10, 2012
Summary
This study introduces a novel alignment method for multilevel soft lithography, enhancing registration accuracy for micro/nanofabrication. The technique minimizes distortions in soft polydimethylsiloxane stamps, achieving sub-micrometer misalignment for precise device fabrication.
Area of Science:
- Microfabrication
- Materials Science
- Nanotechnology
Background:
- Soft lithography is crucial for fabricating micro/nanoscale structures.
- Accurate alignment is vital for multilevel soft lithography.
- Soft stamp materials like polydimethylsiloxane (PDMS) are prone to distortions, reducing registration accuracy.
Purpose of the Study:
- To develop an alignment method that minimizes distortions in soft lithography.
- To improve registration accuracy in multilevel soft lithography.
- To enable precise fabrication of micro/nanometer-sized structures and devices.
Main Methods:
- Reinforcing PDMS stamps with a polymer foil.
- Minimizing applied forces during the lithography process.
- Employing an additive moiré fringe technique for alignment.
Main Results:
- Achieved less than 1 μm misalignment on rigid templates.
- Demonstrated an average registration accuracy of 1.3 μm over 400 mm² using transfer printing of gold films.
- The moiré fringe technique proved easy to implement with minimal processing.
Conclusions:
- The developed method effectively reduces distortions and enhances registration accuracy in soft lithography.
- This versatile technique is applicable to various soft lithography methods.
- Further improvements are possible with smaller moiré gratings and harder stamp materials.
