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Ultrafast polymerization inhibition by stimulated emission depletion for three-dimensional nanolithography
Joachim Fischer1, Martin Wegener
1Karlsruhe Institute of Technology, Wolfgang-Gaede-Straße 1, Karlsruhe, Germany. joachim.fischer@kit.edu
Advanced Materials (Deerfield Beach, Fla.)
|February 11, 2012
Abstract:
To identify the depletion mechanism in the stimulated-emission-depletion (STED) inspired photoresist composed of a ketocoumarin photoinitiator in pentaerythritol tetraacrylate, we perform lithography with pulsed excitation and tunable delayed depletion. A fast component can unambiguously be assigned to stimulated emission. Our results allow the systematical optimization of the conditions in next-generation STED direct-laser-writing optical lithography.
