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Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers

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Aligned sub-10-nm block copolymer patterns templated by post arrays.

Jae-Byum Chang¹, Jeong Gon Son, Adam F Hannon

¹Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA.

|February 24, 2012

Summary

Templated self-assembly of block copolymers creates ordered nanopatterns. Lithographic posts guide poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) to form aligned sub-10-nm lines with controlled orientation.

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Area of Science:

Materials Science
Nanotechnology
Polymer Science

Background:

Block copolymer self-assembly yields periodic nanopatterns.
Templating is crucial for long-range order and pattern registration.
Controlling nanopattern orientation is essential for device fabrication.

Purpose of the Study:

To demonstrate fabrication of aligned sub-10-nm line patterns.
To control the in-plane orientation of block copolymer cylinders.
To investigate the effect of template geometry on self-assembly.

Main Methods:

Utilized lithographically formed post arrays as templates.
Employed a 16 kg/mol poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) diblock copolymer.
Varied post spacing and geometry to control pattern orientation.
Modeled results using 3D self-consistent field theory.

Main Results:

Achieved aligned sub-10-nm line width patterns with controlled orientation.
Demonstrated control over block copolymer cylinder orientation by adjusting post dimensions.
Identified the influence of post height and diameter on self-assembly outcomes.

Conclusions:

Lithographic posts effectively template block copolymer self-assembly for ordered nanopatterns.
Post geometry is a key factor in directing nanopattern orientation.
This method enables the production of precisely oriented, high-resolution line arrays.