MOSFET: Enhancement Mode
MOS Capacitor
Metal-Semiconductor Junctions
Semiconductors
Biasing of Metal-Semiconductor Junctions
Characteristics of MOSFET
You might also read
Articles linked to this work by shared authors, journal, and citation graph.
Updated: May 24, 2026

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
Massimiliano Cavallini1, Zahra Hemmatian, Alberto Riminucci
1Consiglio Nazionale delle Ricerche-Istituto per lo Studio dei Materiali, Nanostrutturati (CNR-ISMN), Bologna, Italy. m.cavallini@bo.ismn.cnr.it
Researchers developed a novel silicon dioxide (SiO2) nanomemristor with nanoscale spatial control. This device can regenerate after damage and allows interface access for further study.
Area of Science:
Background:
Purpose of the Study:
Main Methods:
Main Results:
Conclusions: