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Related Experiment Video

Updated: May 24, 2026

Demonstration of a Hyperlens-integrated Microscope and Super-resolution Imaging

Demonstration of a Hyperlens-integrated Microscope and Super-resolution Imaging

Published on: September 8, 2017

High aspect subdiffraction-limit photolithography via a silver superlens.

Hong Liu¹, Bing Wang, Lin Ke

¹Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), 3 Research Link, Singapore 117602.

|March 2, 2012

Summary

Researchers achieved sub-50 nm nanolithography using a smooth silver superlens, enabling high-aspect-ratio nanopatterning. This breakthrough offers a cost-effective path for mass production in semiconductor industries.

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Last Updated: May 24, 2026

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A Method to Fabricate Disconnected Silver Nanostructures in 3D

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Published on: November 27, 2012

Area of Science:

Nanotechnology
Optics
Materials Science

Background:

Photolithography is crucial for semiconductor and data storage manufacturing.
Superlenses offer subdiffraction-limit imaging but lack sufficient pattern depth for lithography.

Purpose of the Study:

To demonstrate sub-50 nm resolution nanophotolithography with high aspect ratio patterns.
To investigate the role of smooth interfaces in superlens performance for lithography.

Main Methods:

Experimental demonstration of nanolithography using a smooth silver superlens.
Theoretical analysis and simulation of superlens behavior.
Fabrication of sub-50 nm patterns with high aspect ratios.

Main Results:

Achieved sub-50 nm resolution nanophotolithography with a ~45 nm high aspect profile.
Demonstrated grayscale subdiffraction-limit 3D nanopatterning.
Identified smooth interfaces as critical for high-quality pattern generation.

Conclusions:

Smooth silver superlenses enable high-resolution, high-aspect-ratio nanolithography.
Superlens technology can be integrated with existing UV photolithography systems.
This approach provides a cost-effective solution for large-scale, rapid nanopatterning.