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Electron cyclotron resonance ion source plasma chamber studies using a network analyzer as a loaded cavity probe
V Toivanen1, O Tarvainen, C Lyneis
1Department of Physics, University of Jyväskylä, Jyväskylä 40500, Finland. ville.toivanen@jyu.fi
The Review of Scientific Instruments
|March 3, 2012
Summary
Researchers used a network analyzer to study plasma in an electron cyclotron resonance ion source (ECRIS). Plasma presence significantly damped the cavity
Area of Science:
- Plasma physics
- Microwave engineering
- Ion source technology
Background:
- Electron Cyclotron Resonance Ion Sources (ECRIS) are crucial for generating ion beams.
- Understanding plasma behavior within the ECRIS chamber is key to optimizing performance.
- Resonance properties of the plasma chamber influence ECRIS efficiency.
Purpose of the Study:
- To present a novel method for studying ECRIS plasma resonance properties.
- To investigate the effects of plasma on the loaded cavity resonance.
- To analyze the influence of microwave power on plasma-induced damping.
Main Methods:
- Utilized a network analyzer as a loaded cavity probe.
- Employed a dual-port technique with simultaneous waveguide excitation and probing.
- Operated microwave source at ~11 GHz for plasma ignition and ~14 GHz for network analysis.
Main Results:
- Demonstrated significant effects of plasma on cavity resonance properties.
- Observed strong damping of frequency-dependent behavior in the presence of plasma.
- Found that increasing microwave power further enhances plasma-induced damping.
Conclusions:
- The loaded cavity probe method effectively characterizes plasma-loaded ECRIS.
- Plasma significantly alters the electromagnetic resonance of the ECRIS chamber.
- Microwave power is a critical parameter influencing plasma damping effects.
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