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Related Concept Videos

X-ray Crystallography02:18

X-ray Crystallography

The size of the unit cell and the arrangement of atoms in a crystal may be determined from measurements of the diffraction of X-rays by the crystal, termed X-ray crystallography.
Diffraction
Diffraction is the change in the direction of travel experienced by an electromagnetic wave when it encounters a physical barrier whose dimensions are comparable to those of the wavelength of the light. X-rays are electromagnetic radiation with wavelengths about as long as the distance between neighboring...

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Related Experiment Video

Updated: May 24, 2026

In situ Grazing Incidence Small Angle X-ray Scattering on Roll-To-Roll Coating of Organic Solar Cells with Laboratory X-ray Instrumentation
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In situ Grazing Incidence Small Angle X-ray Scattering on Roll-To-Roll Coating of Organic Solar Cells with Laboratory X-ray Instrumentation

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Optimum collimator for proximity X-ray lithography - Theoretical analysis.

I A Artioukov1, I V Kozhevnikov, N I Kozhevnikova

  • 1Lebedev Physical Institute, Leninsky prospect 53, Moscow 117924, Russia.

Journal of X-Ray Science and Technology
|March 6, 2012
PubMed
Summary

Soft X-ray optics, using grazing incidence X-ray collimators, significantly boost X-ray proximity lithography efficiency. This technology enables higher resolution patterning for microelectronics fabrication.

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Last Updated: May 24, 2026

In situ Grazing Incidence Small Angle X-ray Scattering on Roll-To-Roll Coating of Organic Solar Cells with Laboratory X-ray Instrumentation
06:49

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Measurement of X-ray Beam Coherence along Multiple Directions Using 2-D Checkerboard Phase Grating
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Measurement of X-ray Beam Coherence along Multiple Directions Using 2-D Checkerboard Phase Grating

Published on: October 11, 2016

Area of Science:

  • Optics and Photonics
  • Microfabrication Technologies
  • Materials Science

Background:

  • X-ray proximity lithography is crucial for microelectronics but limited by source efficiency.
  • Point X-ray sources produce divergent radiation, hindering efficient mask illumination.
  • Enhancing efficiency is key to advancing high-resolution lithographic processes.

Purpose of the Study:

  • To investigate the application of soft X-ray optics for improving X-ray proximity lithography efficiency.
  • To design and analyze an optimal X-ray collimator for a 0.05 µm resolution lithography system.
  • To enhance the performance of lithography systems utilizing point X-ray sources.

Main Methods:

  • Utilizing grazing incidence X-ray collimators to modify radiation characteristics.
  • Designing and analyzing the geometry of an optimal X-ray collimator.
  • Simulating the transformation of divergent X-ray beams into collimated beams.

Main Results:

  • Grazing incidence X-ray collimators increase lithography efficiency by several hundred times.
  • The proposed collimator design ensures uniform mask illumination at normal incidence.
  • The system achieves a spatial resolution of 0.05 µm.

Conclusions:

  • Soft X-ray optics, specifically grazing incidence collimators, offer a substantial efficiency enhancement for X-ray proximity lithography.
  • The developed collimator design is suitable for high-resolution lithography systems.
  • This approach provides a viable path for more efficient and precise microfabrication.