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Published on: March 2, 2021
Optimum collimator for proximity X-ray lithography - Theoretical analysis
I A Artioukov1, I V Kozhevnikov, N I Kozhevnikova
1Lebedev Physical Institute, Leninsky prospect 53, Moscow 117924, Russia.
Abstract:
The paper deals with the application of soft X-ray optics to the enhancement of the efficiency of X-ray proximity lithography based on a point X-ray source. The grazing incidence X-ray collimators are shown to increase the efficiency coefficient in several hundreds times. The design of the optimum X-ray collimator is proposed and analysed for the scheme of X-ray proximity lithography with spatial resolution 0.05 µm. The collimator transforms the divergent radiation of an X-ray point source into high collimated beam that illuminates uniformly the mask at normal incidence.
