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Cross-section control of stacked nanowires formed by Bosch process and oxidation
Xuan Zuo1, Tao Wang, Ricky M Y Ng
1Department of Electronic and Computer Engineering, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong.
Abstract:
The cross-sectional shape of the stacked silicon nanowires (SiNWs) formed by the Bosch process and stress-limited oxidation is studied in this paper. Under the condition of high temperature oxidation, the resulting nanowires highly resemble the initial shapes resulting by the Bosch process. The effects of etching and passivation in the Bosch process are modeled to provide a guideline to control the cross-section of the stacked nanowires.
