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Updated: May 24, 2026

Fabrication of Low Temperature Carbon Nanotube Vertical Interconnects Compatible with Semiconductor Technology
Published on: December 7, 2015
Nanotube substituted source/drain regions for carbon nanotube transistors for VLSI circuits
Shibesh Dutta1, Balakrishnan Shankar
1Department of ECE, Amrita Vishwa Vidyapeetham, Kerala 690525, India.
Abstract:
Aggressive scaling of silicon technology over the years has pushed CMOS devices to their fundamental limits. Pioneering works on carbon nanotube during the last decade possessing exceptional electrical properties have provided an intriguing solution for high performance integrated circuits. So far, at best, carbon nanotubes have been considered only for the channel, with metal electrodes being used for source/drain. Here, alternative schemes of 'All-Nanotube' transistor are presented where even the transistor components are derived from carbon nanotubes which hold the promise for smaller, faster, denser and more power efficient electronics.
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