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Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers
Published on: June 30, 2018
Controlling order in block copolymer thin films for nanopatterning applications
Andrew P Marencic1, Richard A Register
1Department of Chemical and Biological Engineering, Princeton University, Princeton, NJ 08544, USA.
Annual Review of Chemical and Biomolecular Engineering
|March 22, 2012
Summary
This review covers techniques for guiding block copolymer self-assembly in thin films. These methods enable precise control over nanometer-scale patterns for advanced lithography applications.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Chemistry
Background:
- Block copolymer thin films are used for sub-100 nm lithographic patterning.
- As-cast films lack the necessary order for many applications.
- Achieving ordered nanostructures is crucial for advanced fabrication.
Purpose of the Study:
- To review techniques for guiding block copolymer self-assembly in thin films.
- To provide control over the orientation and position of microdomains.
- To enable precise nanometer-scale pattern formation.
Main Methods:
- Summarizing techniques for controlling out-of-plane order.
- Reviewing methods for lateral ordering, including defect-free grain generation.
- Discussing techniques for orientational and positional control of microdomains.
Main Results:
- Various techniques offer degrees of control over microdomain self-assembly.
- Methods exist to control both out-of-plane and lateral ordering.
- Experimental examples illustrate the mechanisms of guided self-assembly.
Conclusions:
- Guided self-assembly is key to unlocking the potential of block copolymers for lithography.
- Precise control over nanostructure formation is achievable.
- This review provides a comprehensive overview of current techniques and their underlying mechanisms.
