A cinnamic acid-type photo-cleavable surfactant.

Hideki Sakai1, Shohei Aikawa, Wataru Matsuda

  • 1Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan. hisakai@rs.noda.tus.ac.jp

Summary

Researchers created a novel cinnamic acid-type photo-cleavable surfactant that breaks down under UV light. This process yields functional materials and alters interfacial properties, demonstrating a photo-responsive, function-exchangeable material.

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