Gate effects on DNA translocation through silicon dioxide nanopore

Pei-chun Yen1, Chung-hsuan Wang, Gwo-Jen Hwang

  • 1Department of Physics, National Tsing-Hua University, Hsinchu, Taiwan.

Summary

Applying a positive gate voltage significantly increases DNA translocation time through nanopores. This voltage also reduces current blockage amplitude and event frequency, aligning with theoretical predictions.

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