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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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Evidence for the formation of UO2(NO3)4(2-) in an ionic liquid by EXAFS

Clotilde Gaillard1, Olga Klimchuk, Ali Ouadi

  • 1University of Lyon, Institut de Physique Nucléaire de Lyon, CNRS-IN2P3, 69622 Villeurbanne cedex, France. c.gaillard@ipnl.in2p3.fr

Dalton Transactions (Cambridge, England : 2003)
|April 3, 2012
PubMed

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